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Chemical Vapor Deposition

Published by Wiley (John Wiley & Sons).

ISSN 0948-1907 / 1521-3862
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Aims & scope

Chemical Vapor Deposition publishes peer-reviewed research. Manuscripts pass a technical check and a scope check by the handling editor before going to independent reviewers.

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Recently published

Chem. Vap. Deposition (10–11–12/2015)
Authors not listed · 2015
DOI 10.1002/cvde.201571012
Chem. Vap. Deposition (10–11–12/2015)
Authors not listed · 2015
DOI 10.1002/cvde.201571013
Untitled
Authors not listed · 2015
DOI 10.1002/cvde.v21.10-11-12
DOI 10.1002/cvde.201571011
DOI 10.1002/cvde.201571015
Chem. Vap. Deposition (10–11–12/2015)
Authors not listed · 2015
DOI 10.1002/cvde.201571014
From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition
Anatolii A. Malygin, Victor E. Drozd, Anatolii A. Malkov, Vladimir M. Smirnov · 2015
DOI 10.1002/cvde.201502013
Farewell and Welcome
Michael L. Hitchman · 2015
DOI 10.1002/cvde.201502015
CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics
Marina V. Baryshnikova, Leonid A. Filatov, Andrey S. Petrov, Sergey E. Alexandrov · 2015
DOI 10.1002/cvde.201507187
Phase‐selective Route to V‐O Film Formation: A Systematic MOCVD Study Into the Effects of Deposition Temperature on Structure and Morphology
Simon F. Spanò, Roberta G. Toro, Guglielmo G. Condorelli, Grazia M. L. Messina, Giovanni Marletta, Graziella Malandrino · 2015
DOI 10.1002/cvde.201507186
Uniform Coating of Microparticles using CVD Polymerization
Yu Liang, Jacob H. Jordahl, Hao Ding, Xiaopei Deng, Joerg Lahann · 2015
DOI 10.1002/cvde.201507197
DOI 10.1002/cvde.201507191
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